Hydrofluoric acid is a solution of hydrogen fluoride (HF) in water.
It is a precursor to almost all fluorine compounds, including pharmaceuticals such as fluoxetine, diverse materials such as PTFE and elemental fluorine itself.
It is a colourless solution that is highly corrosive, capable of dissolving many materials, especially oxides. Its ability to dissolve glass has been known since the 17th century.
Because of its high reactivity towards glass and moderate reactivity towards many metals, hydrofluoric acid is usually stored in plastic containers.
Hydrogen fluoric gas is an acute poison that may immediately and permanently damage lungs and the corneas of the eyes.
Aqueous hydrofluoric acid is a contact-poison with the potential for deep initially painless burns and ensuing tissue death.
By interfering with body calcium metabolism, the concentrated acid may also cause system toxicity and eventual cardiac arrest and fatality, after contact with as little as 25 square inches of skin, so it’s a substance not to be messed with.
HF is used mainly for industrial purposes …
Manufacturing of electronic components
Pickling of metals
Alkylation in the refining oil
Dissolving rock samples for analysis
Hydrofluoric Acid Awareness Training is ideal for anyone working with, responsible for, or adjacent to activities involving Hydrofluoric Acid.
DBI Control have a customer with etching machines containing traces of Hydrofluoric Acid, so we contacted Universal Safety Solutions to get the essential training.
Our trainer Mike made us aware of the hazards posed by this challenging substance, along with the pertinent steps to take should there be an adverse incident.
Exposure to HF is a serious and potentially life-threatening situationfor the victim, and highly hazardous for those treating the casualty.
Clear understanding and knowledge of the properties of HF are vital for the safe and successful treatment of any exposure, and now the DBI Control team are confident and qualified in their ability to handle a situation involving HF.